Surface nanopatterns induced by ion-beam sputtering
نویسندگان
چکیده
منابع مشابه
Morphology change of the silicon surface induced by Ar ion beam sputtering
It is well known that low and medium energy ion sputtering may induce a fabrication of periodic nanoscale structures on an irradiated surface [1]. Depending on the sputtered substrate characteristics and sputtering conditions, different types of nanoscale structures such as ripples, nanoholes and nanodots can grow on a target during ion beam sputtering [2–6]. These patterns have been found on b...
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The diffusion process on Si (0 0 1) in the presence of a 5 keV Ar+ ion beam has been investigated by monitoring initiation of ripple-pattern formation. The morphology of the surface obtained by scanning tunnelling microscopy measurements in ultrahigh vacuum were characterized using the height-difference correlation function. These measurements clearly show formation of nanostructured ripple pat...
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ژورنال
عنوان ژورنال: Journal of Physics: Condensed Matter
سال: 2009
ISSN: 0953-8984,1361-648X
DOI: 10.1088/0953-8984/21/22/220301